Handbook of Thin Film Deposition 5th Edition

Capture the cutting edge of thin-film science with the Handbook of Thin Film Deposition, 5th Edition by Dominic Schepis. This authoritative guide delivers a clear, practical roadmap to modern deposition techniques—perfect for engineers, researchers, and students working in semiconductors, optics, coatings, and nanotechnology.

Start with fundamental principles and move straight into real-world application: physical vapor deposition (PVD), chemical vapor deposition (CVD), sputtering, evaporation, atomic layer deposition (ALD), vacuum technology, process control, and materials selection. Each chapter balances theoretical insight with actionable troubleshooting tips, equipment considerations, and measurement strategies so you can optimize film uniformity, adhesion, and performance in lab and production environments.

Designed for global use by professionals in North America, Europe, and Asia-Pacific, this edition reflects the latest advances in thin film materials, process scaling, and quality assurance. Whether you’re developing high-performance optical coatings, reliable microelectronic layers, or durable industrial films, the book equips you to reduce defects, improve yield, and accelerate R&D.

Readable yet comprehensive, the handbook is an essential desk reference for process engineers, R&D teams, academic instructors, and advanced students. With clear diagrams, practical examples, and industry-focused guidance, it bridges the gap between academic theory and manufacturing realities.

Ready to advance your thin-film expertise? Add the Handbook of Thin Film Deposition, 5th Edition by Dominic Schepis to your library and bring precision, consistency, and innovation to your deposition processes—order now.

Note: eBooks do not include supplementary materials such as CDs, access codes, etc.