Nanostructured Thin Film Deposition by Sputtering

Nanostructured Thin Film Deposition by Sputtering — a definitive guide from Kanak Kalita, Ranjan Kumar Ghadai, Manoj Gupta and J. Paulo Davim — brings cutting-edge sputtering techniques into clear, practical focus for researchers, engineers and advanced students.

Step into a concise, well-organized treatment of sputter-based nanostructured thin film deposition that balances theory with hands-on application. Clear explanations of sputtering physics, process parameters, target materials and substrate interactions are paired with discussions of microstructure control, characterization methods and performance optimization for coatings used in microelectronics, optics, sensors and surface engineering. Detailed case studies and comparative analyses illuminate how process choices influence adhesion, density, crystallinity and functional properties.

Whether you work in academic research, industrial R&D or semiconductor manufacturing, this book equips you with actionable insights to improve film uniformity, tailor composition gradients and scale laboratory methods toward production. Its practical orientation makes it especially valuable for teams focused on thin film devices, MEMS, optical coatings and protective layers.

Globally relevant, the text addresses challenges faced by labs and fabrication facilities across major technology regions — from North America and Europe to Asia’s semiconductor clusters — helping professionals translate laboratory results into reproducible manufacturing outcomes.

For anyone seeking a compact, authoritative reference on sputtering-based nanostructured films, Nanostructured Thin Film Deposition by Sputtering offers the clarity, technical depth and real-world perspective needed to advance material performance and process reliability. Add it to your collection to sharpen your practice and accelerate development.

Note: eBooks do not include supplementary materials such as CDs, access codes, etc.